Journal: Advanced Science
Article Title: X‐Ray Multibeam Ptychography at up to 20 keV: Nano‐Lithography Enhances X‐Ray Nano‐Imaging
doi: 10.1002/advs.202310075
Figure Lengend Snippet: Reconstructed object phase from the 12‐beam measurement of the Siemens star test pattern at 13 keV; a) overall image, colored squares represent regions irradiated by each individual beam respectively; b) magnified central region partially scanned by two neighboring probes; c) magnified region with smallest features—50 nm, red line indicates the position for the line profile; d) line profile of the edge estimating resolution; The color bar represents phase shift in radians. The pixel size in reconstruction is 8 nm.
Article Snippet: [ ] A Siemens star resolution test chart sample was again taken as an initial measurement at 20 keV.
Techniques: Irradiation